為掃(sao)描(miao)儀系(xi)(xi)統(tong)(tong)(tong)(tong)和(he)(he)小型(xing)環(huan)境(jing)的(de)清(qing)理提供先進的(de)二層保(bao)護。 如(ru)果(guo)需要額外(wai)的(de)保(bao)護或沒有(you)空(kong)氣(qi)處(chu)理系(xi)(xi)統(tong)(tong)(tong)(tong)，則可(ke)以化學凈化環(huan)境(jing)空(kong)氣(qi)。E2000 預過(guo)(guo)濾器外(wai)殼和(he)(he)空(kong)氣(qi)循環(huan)系(xi)(xi)統(tong)(tong)(tong)(tong)是我們(men)市場的(de) OEM 掃(sao)描(miao)儀集(ji)成過(guo)(guo)濾器系(xi)(xi)統(tong)(tong)(tong)(tong)的(de)自然延伸。 E2000 系(xi)(xi)統(tong)(tong)(tong)(tong)增強了對空(kong)氣(qi)中低分子(zi)量硅(gui) (LMWSi) 和(he)(he)可(ke)冷凝有(you)機物的(de)鏡片污染的(de)保(bao)護。它滿足 Nikon、ASML 和(he)(he) Canon photobay 環(huan)境(jing)規范并延長 OEM 掃(sao)描(miao)儀過(guo)(guo)濾器有(you)機物的(de)使用(yong)壽命。作為獨(du)立系(xi)(xi)統(tong)(tong)(tong)(tong)使用(yong)，E2000 系(xi)(xi)統(tong)(tong)(tong)(tong)可(ke)以通(tong)過(guo)(guo)再循環(huan)空(kong)氣(qi)和(he)(he)去除導致腐蝕和(he)(he)工藝問題的(de)空(kong)氣(qi)污染物來清(qing)潔設施。

選擇吸附化學物(wu)(wu)質(zhi)以(yi)大(da)限度地提高目標 AMC（空氣中的(de)分子污染物(wu)(wu)）的(de)容量

匹配現(xian)有的 OEM 掃描(miao)儀過濾(lv)系統

用于過濾小型設施的(de)緊湊型獨立解決(jue)方(fang)案(an)

適(shi)用(yong)于所(suo)有應用(yong)的輕松(song)改造

符合 Nikon、ASML 和 Canon 環境(jing)規范